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Study of Chemically Amplified Resist Using an Electron Beam Recorder
Kasono, Osamu, Sugimoto, Tatsuya, Katsumura, Masahiro, Higuchi, Takanobu, Kojima, Yoshiaki, Iida, TetsuyaVolume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.764
Date:
February, 2003
File:
PDF, 968 KB
english, 2003