Internal Stress in Polycrystalline Si Film Recrystallized...

Japanese Journal of Applied Physics 2004 / 2 Vol. 43; Iss. 2

Internal Stress in Polycrystalline Si Film Recrystallized by Excimer Laser Annealing

Matsuo, Naoto, Kawamoto, Naoya, Hamada, Hiroki
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.532
Date:
February, 2004
File:
PDF, 134 KB
english, 2004
Conversion to is in progress
Conversion to is failed