Shallow Trench Isolation Top Corner Rounding Using Si Soft...

Japanese Journal of Applied Physics 2004 / 11 Vol. 43; Iss. 11A

Shallow Trench Isolation Top Corner Rounding Using Si Soft Etching Following Diluted Hydrofluorine Solution

Mun, Seong Yeol, Shin, Kyeong Cheol, Yoon, Ki Chae, Kwak, Jong Seok, Ryu, Hyuk Hyun, Jeong, Yang Hee
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Volume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.7701
Date:
November, 2004
File:
PDF, 165 KB
english, 2004
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