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In situ Deep Etching for an InGaAlAs Buried Heterostructure by Using HCl Gas in a Metalorganic Vapor Phase Epitaxy Reactor
Tsuchiya, Tomonobu, Kitatani, Takeshi, Ouchi, Kiyoshi, Sato, Hiroshi, Aoki, MasahikoVolume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.L1247
Date:
September, 2004
File:
PDF, 1.79 MB
english, 2004