Dry Etching of Cr 2 O...

Japanese Journal of Applied Physics 2005 / 1 Vol. 44; Iss. 1A

Dry Etching of Cr 2 O 3 /Cr Stacked Film during Resist Ashing by Oxygen Plasma

Tonotani, Junichi, Ohmi, Shun-ichiro, Iwai, Hiroshi
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.114
Date:
January, 2005
File:
PDF, 188 KB
english, 2005
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