Effect of Nitrogen Doping on Oxygen Precipitate Profiles in...

Japanese Journal of Applied Physics 2006 / 6 Vol. 45; Iss. 6A

Effect of Nitrogen Doping on Oxygen Precipitate Profiles in Czochralski Silicon Wafer

Cui, Can, Yang, Deren, Ma, Xiangyang, Que, Duanlin
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Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.4903
Date:
June, 2006
File:
PDF, 2.60 MB
english, 2006
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