Characterization of Argon Fast Atom Beam Source and...

Japanese Journal of Applied Physics 2006 / 6 Vol. 45; Iss. 6B

Characterization of Argon Fast Atom Beam Source and Application to Mesa Etching Process for GaInP/GaAs Triple-Barrier Resonant Tunneling Diodes

Suhara, Michihiko, Matsuzaka, Norihiko, Fukumitsu, Masakazu, Okumura, Tsugunori
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Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.5504
Date:
June, 2006
File:
PDF, 175 KB
english, 2006
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