Study of Si 3 N...

Japanese Journal of Applied Physics 2010 / 8 Vol. 49; Iss. 8

Study of Si 3 N 4 /SiO 2 /Si and SiO 2 /Si 3 N 4 /Si Multilayers by O and N K-Edge X-ray Absorption Spectroscopy

Lee, Youn-Seoung, Lee, Won-Jun, Kang, Sung-Kyu, Rha, Sa-Kyun
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.08JF05
Date:
August, 2010
File:
PDF, 193 KB
english, 2010
Conversion to is in progress
Conversion to is failed