Low-pressure plasma-etching of bulk polymer materials using...

AIP Advances 2013 Vol. 3; Iss. 11

Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF4 and O2

Nabesawa, Hirofumi, Hiruma, Takaharu, Hitobo, Takeshi, Wakabayashi, Suguru, Asaji, Toyohisa, Abe, Takashi, Seki, Minoru
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Volume:
3
Year:
2013
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.4830277
File:
PDF, 1.37 MB
english, 2013
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