Fluorinated silicon nitride film for the bottom antireflective layer in quarter micron optical lithography
Jun, Byung-Hyuk, Han, Sang-Soo, Lee, Joon Sung, Kim, Yong-Beom, Kang, Ho-Young, Koh, Young-Bum, Jiang, Zhong-Tao, Bae, Byeong-Soo, No, KwangsooVolume:
12
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/12/7/026
Date:
July, 1997
File:
PDF, 394 KB
english, 1997