Ion-Bombardment-Induced Improvement of Photoresist Mask Properties for RF Sputter-Etching
Iida, Yasuo, Okabayashi, Hidekazu, Suzuki, KatsumiVolume:
16
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.16.1313
Date:
August, 1977
File:
PDF, 304 KB
english, 1977