Radiation Annealing of Boron-Implanted Silicon with a...

Japanese Journal of Applied Physics 1980 / 10 Vol. 19; Iss. 10

Radiation Annealing of Boron-Implanted Silicon with a Halogen Lamp

Nishiyama, Kazuo, Arai, Michio, Watanabe, Naozo
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
19
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.19.L563
Date:
October, 1980
File:
PDF, 100 KB
english, 1980
Conversion to is in progress
Conversion to is failed