Secondary Ion Analysis of Silicon under Ar + Ion Etching in Chlorine and Fluorine Flux
Ikawa, Eiji, Kurogi, YukinoriVolume:
22
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.22.1263
Date:
August, 1983
File:
PDF, 354 KB
english, 1983