Formation of Shallow p + n Junctions by B-Ion Implantation in Si substrates with Amorphous Layers
Ishiwara, Hiroshi, Horita, SusumuVolume:
24
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.568
Date:
May, 1985
File:
PDF, 5.95 MB
english, 1985