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Profile Controlled Etching for Mo/WSi x Double Layers
Kuriyama, Yoichi, Suzuki, Masamitsu, Hirayama, MasahiroVolume:
25
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.25.L96
Date:
February, 1986
File:
PDF, 634 KB
1986