Sub-Halfmicron Lithography Using a High-Contrast i-Line CEL
Tanaka, Toshihiko, Uchino, Shouichi, Hashimoto, Michiaki, Hasegawa, Norio, Fukuda, Hiroshi, Okazaki, ShinjiVolume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.1860
Date:
September, 1990
File:
PDF, 1.14 MB
english, 1990