Area-Selective Aluminum Patterning Using Atomic Hydrogen...

Japanese Journal of Applied Physics 1993 / 1 Vol. 32; Iss. Part 1, No

Area-Selective Aluminum Patterning Using Atomic Hydrogen Resist

Tsubouchi, Kazuo, Masu, Kazuya, Sasaki, Keiichi
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Volume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.278
Date:
January, 1993
File:
PDF, 420 KB
english, 1993
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