Metalorganic Chemical Vapor Deposition of Aluminum-Copper Alloy Films
Katagiri, Tomoharu, Kondoh, Eiichi, Takeyasu, Nobuyuki, Nakano, Tadashi, Yamamoto, Hiroshi, Ohta, TomohiroVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.L1078
Date:
August, 1993
File:
PDF, 311 KB
english, 1993