Effects of Oxygen Added to Reagent Gas on Chemical Vapor...

Japanese Journal of Applied Physics 1994 / 3 Vol. 33; Iss. Part 2, No

Effects of Oxygen Added to Reagent Gas on Chemical Vapor Deposition of Diamond Thin Films

Kim, Tae-Hyun, Kobayashi, Takeshi
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Volume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L459
Date:
March, 1994
File:
PDF, 1.29 MB
english, 1994
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