Effect of Lens Aberration on Resist Pattern Profiles in...

Japanese Journal of Applied Physics 1995 / 9 Vol. 34; Iss. Part 1, No

Effect of Lens Aberration on Resist Pattern Profiles in Edge-Line Phase-Shift Method

Nakatani, Mitsunori, Kojima, Yoshiki, Nakano, Hirofumi, Kamon, Kazuya, KazuhikoSato,, Takano, Hirozou, Ishihara, Osamu
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Volume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.5043
Date:
September, 1995
File:
PDF, 142 KB
english, 1995
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