Adsorption Behavior of Various Fluorocarbon Gases on...

Japanese Journal of Applied Physics 2005 / 4 Vol. 44; Iss. 4B

Adsorption Behavior of Various Fluorocarbon Gases on Silicon Wafer Surface

Hidaka, Atsushi, Yamashita, Satoru, Ishii, Hidekazu, Kato, Takeyoshi, Tanahashi, Naoki, Kitano, Masafumi, Goto, Tetsuya, Teramoto, Akinobu, Shirai, Yasuyuki, Ohmi, Tadahiro
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2245
Date:
April, 2005
File:
PDF, 457 KB
english, 2005
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