Time-Resolved Measurement of Charging on Hole Bottoms of...

Japanese Journal of Applied Physics 2005 / 8 Vol. 44; Iss. No. 35

Time-Resolved Measurement of Charging on Hole Bottoms of SiO 2 Wafer Exposed to Plasma Etching in a Pulsed Two-Frequency Capacitively Coupled Plasma

Ohmori, Takeshi, Kamata Goto, Takeshi, Kitajima, Takeshi, Makabe, Toshiaki
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.L1105
Date:
August, 2005
File:
PDF, 329 KB
english, 2005
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