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Evaluation of Crystallinity in 4H-SiC{0001} Epilayers Thermally Etched by Chlorine and Oxygen System
Hatayama, Tomoaki, Yano, Hiroshi, Uraoka, Yukiharu, Fuyuki, TakashiVolume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.L690
Date:
July, 2006
File:
PDF, 366 KB
english, 2006