Device Isolation by Plasma Treatment for Planar Integration...

Device Isolation by Plasma Treatment for Planar Integration of Enhancement/Depletion-Mode AlGaN/GaN High Electron Mobility Transistors

Wang, Ruonan, Cai, Yong, Tang, Wilson C. W., Lau, Kei May, Chen, Kevin J.
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Volume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.2330
Date:
April, 2007
File:
PDF, 218 KB
english, 2007
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