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Characteristics of Silicon Dioxide Film Deposited by Neutral Beam-Assisted Chemical Vapor Deposition
Im, Young, Lee, Jung Hee, Lee, Youn-Seoung, Lee, Won-Jun, Rha, Sa-KyunVolume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.8905
Date:
December, 2008
File:
PDF, 266 KB
english, 2008