Analysis of Amorphous Alumina Thin Film Etching by...

Japanese Journal of Applied Physics 2009 / 8 Vol. 48; Iss. 8

Analysis of Amorphous Alumina Thin Film Etching by Phosphate Buffer Using Surface Plasmon Resonance

Konishi, Miyuki, Gawazawa, Naoki, Kishimoto, Shin-ichi, Ohshio, Shigeo, Akasaka, Hiroki, Saitoh, Hidetoshi
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.086502
Date:
August, 2009
File:
PDF, 215 KB
english, 2009
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