Gas Adsorption Properties of Fluorocarbon Thin Films...

Japanese Journal of Applied Physics 2010 / 4 Vol. 49; Iss. 4

Gas Adsorption Properties of Fluorocarbon Thin Films Prepared Using Three Different Types of RF Magnetron Sputtering Systems

Iwamori, Satoru, Hasegawa, Norihiko, Yano, Satoshi, Noda, Kazutoshi
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.04DK17
Date:
April, 2010
File:
PDF, 138 KB
english, 2010
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