Tungsten Contact and Line Resistance Reduction with Advanced Pulsed Nucleation Layer and Low Resistivity Tungsten Treatment
Chandrashekar, Anand, Chen, Feng, Lin, Jasmine, Humayun, Raashina, Wongsenakhum, Panya, Chang, Sean, Danek, Michal, Itou, Takamasa, Nakayama, Tomoo, Kariya, Atsushi, Kawaguchi, Masazumi, Hizume, ShuniVolume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.096501
Date:
September, 2010
File:
PDF, 291 KB
english, 2010