Study of Cu-Inhibitor State for Post-Chemical Mechanical...

Japanese Journal of Applied Physics 2011 / 5 Vol. 50; Iss. 5

Study of Cu-Inhibitor State for Post-Chemical Mechanical Polishing Cleaning

Harada, Ken, Ito, Atsushi, Kawase, Yasuhiro, Suzuki, Toshiyuki, Hara, Makoto, Sakae, Rina, Kimura, Chiharu, Aoki, Hidemitsu
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.05EC06
Date:
May, 2011
File:
PDF, 731 KB
english, 2011
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