Low Energy Xe + Ion Beam...

Japanese Journal of Applied Physics 2011 / 6 Vol. 50; Iss. 6

Low Energy Xe + Ion Beam Machining of the Ultralow Expansion Glass Substrates for Aspherical Extreme Ultraviolet Lithography Projection Optics

Endo, Hironori, Yamada, Junya, Pahlovy, Shahjada A., Miyamoto, Iwao
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.06GB06
Date:
June, 2011
File:
PDF, 653 KB
english, 2011
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