Numerical Analysis of the Chemical Vapor Deposition of Polysilicon in a Trichlorosilane and Hydrogen System
Fang, M., Xiong, Y.Y., Yuan, X.Z., Liu, Y.W.Volume:
61
Year:
2014
Language:
english
Journal:
Energy Procedia
DOI:
10.1016/j.egypro.2014.12.058
File:
PDF, 485 KB
english, 2014