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Structures and Properties of Zr–N Films Prepared by ECR-Microwave Plasma Source Enhanced Direct-Current Magnetron Sputtering Under Different N 2 Partial Pressures
Tian-Wei, Liu, Xin-Lu, Deng, Xiao-Ying, Wang, Ying-Min, Wang, Jian-Xin, Zou, Chuang, DongVolume:
21
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/21/10/040
Date:
October, 2004
File:
PDF, 485 KB
english, 2004