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Fabrication of sub-lithography-limited structures via Nanomasking technique for plasmonic enhancement applications
S. Bauman, E. Novak, D. Debu, D. Natelson, J. HerzogYear:
2015
Language:
english
DOI:
10.1109/TNANO.2015.2457235
File:
PDF, 1.51 MB
english, 2015