Minimization of Residual Stress in SOI Films by Using AlN...

Japanese Journal of Applied Physics 1985 / 8 Vol. 24; Iss. Part 2, No

Minimization of Residual Stress in SOI Films by Using AlN Interlaid Insulator

Ogura, Atsushi, Egami, Koji, Kimura, Masakazu
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Volume:
24
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.L669
Date:
August, 1985
File:
PDF, 147 KB
english, 1985
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