In Situ Observation of Electromigration in Cu...

Japanese Journal of Applied Physics 1991 / 12 Vol. 30; Iss. Part 1, No

In Situ Observation of Electromigration in Cu Film Using Scanning µ-Reflection High-Energy Electron Diffraction Microscope

Masu, Kazuya, Hiura, Yohei, Tsubouchi, Kazuo, Ohmi, Tadahiro, Mikoshiba, Nobuo
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Volume:
30
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.3642
Date:
December, 1991
File:
PDF, 221 KB
english, 1991
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