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Measurements of Plasma Controlled by Compressed Magnetic Field Magnetron Sputtering Technique
Ido, Shunji, Ishida, Yukihiro, Hijikata, KenichiVolume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.2112
Date:
May, 1993
File:
PDF, 531 KB
1993