![](/img/cover-not-exists.png)
Reactive Ion Etching of BiSrCaCuO Superconducting Thin Films using Ethane and Oxygen
Oishi, Toshiyuki, Takami, Tetsuya, Kuroda, Ken'ichi, Kojima, Kazuyoshi, Wada, Osamu, Nunoshita, MasahiroVolume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L315
Date:
March, 1994
File:
PDF, 74 KB
english, 1994