Excimer-Laser Removal of $\bf SiO_{2}$ Patterns from GaAs...

Japanese Journal of Applied Physics 1994 / 3 Vol. 33; Iss. Part 2, No

Excimer-Laser Removal of $\bf SiO_{2}$ Patterns from GaAs Substrates

Lu, Yong-Feng, Takai, Mikio, Shiokawa, Takao, Aoyagi, Yoshinobu
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Volume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L324
Date:
March, 1994
File:
PDF, 602 KB
english, 1994
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