Interfacial Layers between Si and Ru Films Deposited by Sputtering in Ar/O2 Mixture Ambient
Aoyama, Tomonori, Murakoshi, Atsushi, Koike, Mitsuo, Takeno, Shiro, Imai, KeitaroVolume:
37
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.L242
Date:
February, 1998
File:
PDF, 243 KB
english, 1998