Effectiveness of NH3 Plasma Treatment in Preventing Wet...

Japanese Journal of Applied Physics 2001 / 12 Vol. 40; Iss. Part 2, No

Effectiveness of NH3 Plasma Treatment in Preventing Wet Stripper Damage to Low-K Hydrogen Silsesquioxane (HSQ)

Chang, Ting-Chang, Mor, Yi-Shien, Liu, Po-Tsun, Tsai, Tsung-Ming, Chen, Chi-Wen, Mei, Yu-Jen, Sze, Simon-M.
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Volume:
40
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.L1311
Date:
December, 2001
File:
PDF, 2.08 MB
2001
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