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Sheet Resistance Reduction and Crystallinity Improvement in Ultrashallow n + /p Junctions by Heat-Assisted Excimer Laser Annealing
Kurobe, Ken-ichi, Ishikawa, Yoshinori, Shibahara, KentaroVolume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.8391
Date:
December, 2005
File:
PDF, 147 KB
english, 2005