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High-Rate Deposition of Amorphous Silicon Films by Microwave-Excited High-Density Plasma
Inoue, Hirotada, Tanaka, Kouji, Sano, Yuichi, Nishimura, Takehiro, Teramoto, Akinobu, Hirayama, Masaki, Ohmi, TadahiroVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.036502
Date:
March, 2011
File:
PDF, 281 KB
english, 2011