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Etch Characterization of TiO$_{2}$ Thin Films Using Metal–Insulator–Metal Capacitor in Adaptively Coupled Plasma
Woo, Jong-Chang, Joo, Young-Hee, Kim, Chang-IlVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.08KC02
Date:
August, 2011
File:
PDF, 276 KB
english, 2011