Ultra-shallow junction technology by atomic layer doping from arsenic adsorbed layer
Song, Y.H., Bae, J.C., Oonishi, M., Honda, T., Kurino, H., Koyanagi, M.Volume:
35
Year:
1999
Language:
english
Journal:
Electronics Letters
DOI:
10.1049/el:19990299
File:
PDF, 228 KB
english, 1999