Growth and characterization of CoSi2 films on Si (100)...

Applied Surface Science 2001 / 1 Vol. 169-170

Growth and characterization of CoSi2 films on Si (100) substrates

Takahashi, F., Irie, T., Shi, J., Hashimoto, M.
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Volume:
169-170
Language:
english
Pages:
5
Journal:
Applied Surface Science
DOI:
10.1016/s0169-4332(00)00684-x
Date:
January, 2001
File:
PDF, 353 KB
english, 2001
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