Computer simulation of gas rarefaction effects and film deposition characteristics in a magnetron sputtering apparatus
Kobayashi, TsukasaVolume:
169-170
Language:
english
Pages:
5
Journal:
Applied Surface Science
DOI:
10.1016/s0169-4332(00)00693-0
Date:
January, 2001
File:
PDF, 284 KB
english, 2001