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Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism
J. Aarik, A. Aidla, H. Mändar, T. UustareVolume:
172
Year:
2001
Language:
english
Pages:
11
DOI:
10.1016/s0169-4332(00)00842-4
File:
PDF, 238 KB
english, 2001