Influence of sputtering pressure on the structure and properties of ZrO2 films prepared by rf reactive sputtering
Pengtao Gao, L.J. Meng, M.P. dos Santos, V. Teixeira, M. AndritschkyVolume:
173
Year:
2001
Language:
english
Pages:
7
DOI:
10.1016/s0169-4332(00)00888-6
File:
PDF, 209 KB
english, 2001