Approaching the limit for quantitative SIMS measurement of...

Applied Surface Science 2001 Vol. 175-176; Iss. none

Approaching the limit for quantitative SIMS measurement of ultra-thin nitrided SiO2 films

Steven W Novak, Evan J Bekos, John W Marino
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Volume:
175-176
Year:
2001
Language:
english
Pages:
7
DOI:
10.1016/s0169-4332(01)00101-5
File:
PDF, 191 KB
english, 2001
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