Anisotropic wet chemical etching of crystalline silicon:...

Applied Surface Science 2001 Vol. 178; Iss. 1-4

Anisotropic wet chemical etching of crystalline silicon: atomistic Monte-Carlo simulations and experiments

M.A Gosalvez, R.M Nieminen, P Kilpinen, E Haimi, V Lindroos
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Volume:
178
Year:
2001
Language:
english
Pages:
20
DOI:
10.1016/s0169-4332(01)00233-1
File:
PDF, 887 KB
english, 2001
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